quartz dish, 15 mm height

Description :

Chempure Quartz Dish Fused silica, used as an industrial raw material, is crafted into various refractory shapes such as crucibles, trays, shrouds, and rollers. These shapes are essential for high-temperature thermal processes, including steelmaking, investment casting, and glass manufacturing. Refractory shapes made from fused silica possess excellent thermal shock resistance and are chemically inert to most elements and compounds. They resist virtually all acids, regardless of concentration, except for hydrofluoric acid, which is highly reactive even at low concentrations. Translucent fused-silica tubes are frequently used to encase electric elements in room heaters, industrial furnaces, and similar applications. Quartz glassware is occasionally used in chemistry laboratories when standard borosilicate glass cannot endure high temperatures. It is often found as a basic element, such as a tube in a furnace or a flask, directly exposed to heat. Technical Details of Chempure® Dish Mechanical Density 2.20 x 103 Kg/m3 Young's Modulus 74 x 106 KN/m2 Rigidity Modulus 32 x 106 KN/m2 Compresive Strength 20 x 106 KN/m2 Tensile Strength 70 x 103 KN/m2 Shear Strength 70 x 103 KN/m2 Moh's Hardness 6 Electrical Electrical Resistivity 2 x 1019 ohm cm at 20oC 2 x 106 ohm cm at 800oC Dielectric Strength 10 KV/mm at 20oC 2.5 KV/mm at 500oC Thermal Strain Point 1385oK Annealing Point 1455oK Softening Point 1853oK Coefficient of Expansion 0.52 x 10-6 per oC Continuous Operating Temp. >1000oC Optical Useful Optical Range Synthetic 180 - 2000nm Natural 275 - 2000nm Refractive Index n D (589 nm) - 1.458 Chemical SiO2 Content 99.995% Total Metallic Impurities 10ppm (Typical) Chemical Inertness Fused quartz is chemically inert, with the exception of reacting to hydrofluoric acid and, at high temperatures, phosphoric acid. It reacts slowly with caustic alkalies at normal temperatures. Additionally, it does not react with water and steam under moderate temperatures and pressures. Detailed information, including transmission curves and levels of chemical impurities, is available upon request.