tetramethylammonium hydroxide, 25% w/w in methanol, thermo scientific chemicals

Description :

Tetramethylammonium hydroxide is used for anisotropic etching of silicon. As a basic solvent, it is used in the development of acidic photoresist in the photolithography process. It acts as phase transfer catalyst and surfactant and is used in the synthesis of ferrofluid in order to inhibit nanoparticle aggregation. It finds application in thermochemolysis, an analytical technique involving both pyrolysis and chemical derivatization of the analyte.